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- W2101828088 abstract "Nanofabrication technologies for patterned structures made from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the using a mask. The more traditional methods as well as a few new methods are discussed in relation with the application. As mask-less methods we discussed direct patterning with ions including FIB, nanopatterning with electron beams, interferometric laser annealing and ion beam induced chemical vapor deposition. The methods using masks are ion irradiation and projection, interference lithography, the use of pre-etched substrates and templates from diblock copolymers and imprint technologies. Also a few remarks are given concerning the magnetic properties of patterned films. Nanometer scale magnetic entities (nanoelements, nanodots, nanomagnets) form a fast growing new area of solid-state physics including the new fields of applications. Two of them are summarized namely media for ultra high-density recording and magnetic logic devices." @default.
- W2101828088 created "2016-06-24" @default.
- W2101828088 creator A5028480381 @default.
- W2101828088 date "2006-07-01" @default.
- W2101828088 modified "2023-09-23" @default.
- W2101828088 title "Patterned Nanomagnetic Films" @default.
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- W2101828088 doi "https://doi.org/10.1007/0-387-23316-4_10" @default.
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