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- W2102182765 abstract "Using extreme ultraviolet interference lithography, we demonstrate patterning of different inorganic photoresists, reaching the highest reported photolithography resolution of 7 nm half-pitch." @default.
- W2102182765 created "2016-06-24" @default.
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- W2102182765 date "2015-01-01" @default.
- W2102182765 modified "2023-09-25" @default.
- W2102182765 title "Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond" @default.
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- W2102182765 doi "https://doi.org/10.1039/c4nr07420c" @default.
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