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- W2103455566 abstract "Tungsten oxide (WO 3 ) thin films were deposited on to unheated Corning glass and silicon substrates by RF magnetron sputtering of metallic tungsten target at various oxygen partial pressures in the range <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M1><mml:mn>4</mml:mn><mml:mo>×</mml:mo><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mo>-</mml:mo><mml:mn>2</mml:mn></mml:mrow></mml:msup></mml:math>–<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M2><mml:mn>1</mml:mn><mml:mo>×</mml:mo><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mo>-</mml:mo><mml:mn>1</mml:mn></mml:mrow></mml:msup></mml:math> Pa. The influence of oxygen partial pressure on the structure and surface morphology and the optical and photoluminescence properties of the films were investigated. X-ray diffraction studies revealed that the deposited films were amorphous in nature. Fourier transform infrared transmission spectra confirmed that the presence of stretching vibration of W-O-W and deformation of W-O bonds related to the WO 3 . The optical transmittance of the films at wavelengths >500 nm increased from 62% to 85% with the increase of oxygen partial pressure. The optical band gap of the films increased from 3.00 to 3.14 eV and the refractive index of the films decreased from 2.26 to 2.08 with the increase of oxygen partial pressure from <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M3><mml:mrow><mml:mn>4</mml:mn><mml:mo>×</mml:mo><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mo>−</mml:mo><mml:mn>2</mml:mn></mml:mrow></mml:msup></mml:mrow></mml:math> to <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M4><mml:mrow><mml:mn>1</mml:mn><mml:mo>×</mml:mo><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mo>−</mml:mo><mml:mn>1</mml:mn></mml:mrow></mml:msup></mml:mrow></mml:math> Pa, respectively. The photoluminescence studies indicated that the intense blue emission which was assigned to band-to-band transition was observed at oxygen partial pressure of <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M5><mml:mrow><mml:mn>6</mml:mn><mml:mo>×</mml:mo><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mo>−</mml:mo><mml:mn>2</mml:mn></mml:mrow></mml:msup></mml:mrow></mml:math> Pa." @default.
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- W2103455566 date "2012-12-01" @default.
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- W2103455566 title "Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films" @default.
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