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- W2103706050 abstract "Metal‐Si Schottky contacts have been made by using various metals in order to investigate the dependence of typical diode parameters, such as the barrier height and the effective Richardson constant, on a film thickness of the metal electrode. In any contact with a metal‐electrode film below 400 Å thickness, the Schottky barrier height evidently varies with the film thickness. The effective Richardson constant obtained by a photoelectrical measurement shows different values, depending upon the choice of metal, and also shows a metal thickness dependence, contrary to the generally accepted theory for metal‐semiconductor contacts. In particular, the effective Richardson constant in a sample made by rf sputtering shows a much larger film thickness dependence than that in a sample by vacuum evaporation." @default.
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- W2103706050 date "1988-04-15" @default.
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- W2103706050 title "Variation in the effective Richardson constant of a metal‐silicon contact due to metal‐film thickness" @default.
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- W2103706050 doi "https://doi.org/10.1063/1.340966" @default.
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