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• W2104150131 abstract "We demonstrate a simple route for fabricating trench-type copper patterns by combining a photo-lithography with a wet etching process. Nanostructured CuO was grown on the patterned Cu current collectors via a simple solution immersion process. And silicon nanoparticles were filled into the patterned Cu current collectors. The strongly immobilized CuO on the patterned Cu exhibited high electrochemical performance, including a high reversible capacity and a high rate capability." @default.
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• W2104150131 date "2012-01-01" @default.
• W2104150131 modified "2023-09-27" @default.
• W2104150131 title "Patterning of electrodes for mechanically robust and bendable lithium-ion batteries" @default.
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• W2104150131 doi "https://doi.org/10.1039/c2jm34626e" @default.
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