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- W2104153770 abstract "Effect of varying the composition of nickel and silicon in NixSiy on the work function of nickel silicide gates was investigated. Composition of nickel and silicon was varied by i) co-sputtering Ni and Si and ii) by changing the layer thickness of nickel, in the case of stacked nickel and silicon on SiO2 and hafnium based high-k dielectrics. Wide range of tuning of work function was achieved on SiO2 dielectrics for both co-sputtered and stacked nickel and silicon. The extent of work function tuning decreased on high-k dielectrics. XRD measurements confirmed the presence of NixSiy phases that conformed to the calculated work function values." @default.
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- W2104153770 date "2019-12-21" @default.
- W2104153770 modified "2023-10-16" @default.
- W2104153770 title "Workfunction Tuning of Nickel Silicide by Varying Nickel and Silicon Composition" @default.
- W2104153770 doi "https://doi.org/10.1149/1.2209278" @default.
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