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• W2104438010 abstract "Increasing demand in technology requirements from IC manufacturers has necessitated that photolithography equipment suppliers design and build tools with many advanced capabilities. These additional features not only add to the complexity of the tools, but also increase the cost. Therefore, in order to keep lithography affordable, it is essential that equipment suppliers increase equipment productivity and extend tool lifetimes to support multiple process generations. As a further challenge, the requirements from different IC manufacturers can be quite dissimilar even for the same technology node (as defined according to the ITRS roadmap). For example, for upcoming process nodes logic manufacturers may require enhanced flexibility to enable imaging of smaller and more complicated features, coupled with tighter overlay performance. In contrast, memory manufacturers may put more emphasis on Critical Dimension Uniformity (CDU) control. Therefore, today's photolithography scanners must be equipped with the latest technologies to achieve better resolution and heightened overlay accuracy, while at the same time delivering continuous improvements to throughput. In order to extend the usable lifetime of the scanner on to next-generation technologies, the system platform must also accommodate further improvements and/or upgrades to achieve the demanding requirements of the future. In addition, the scanners must be flexible enough to integrate Complementary Technologies (CT) that are being developed in parallel to further enhance scanner performance. Litho scanner suppliers are actively addressing these issues and Nikon has developed the Sx20 platform to provide an extendible platform for dry and immersion scanner applications. Immersion scanners such as the NSR-S620D are currently being used in mass production, and support future upgrades to enable enhancements to accuracy and throughput for next-generation manufacturing. In this paper some of the key design concepts of an extendible scanner platform will be discussed. These include enhancing the accuracy and maximizing productivity of the manufacturing environment, which is vital in ensuring the affordability of lithography in the future. To show industry progress in these areas, current performance from leading edge scanners that include overlay, auto focus, and Optical Proximity Effect (OPE) matching data will be presented. In addition, it will be shown how these scanners deliver overlay accuracy sufficient for the 32 nm node and beyond, with focus uniformity less than 20nm (3σ), while utilizing a platform capable of throughput up to 200 wafers per hour. Further, to support future technology nodes, scanners also need to accommodate advanced imaging solutions such as free form illumination sources, Source Mask Optimization (SMO) and Double Pattern Techniques (DPT). Some of these technologies, as well as how they must be integrated with flexible and extendible scanner platforms in order to keep next-generation lithography affordable, will be discussed in this paper." @default.
• W2104438010 created "2016-06-24" @default.
• W2104438010 creator A5087208824 @default.
• W2104438010 date "2011-05-01" @default.
• W2104438010 modified "2023-09-27" @default.
• W2104438010 title "Extendible scanner platforms for mass production, now and in the future" @default.
• W2104438010 cites W2095000420 @default.
• W2104438010 doi "https://doi.org/10.1109/asmc.2011.5898206" @default.
• W2104438010 hasPublicationYear "2011" @default.
• W2104438010 type Work @default.
• W2104438010 sameAs 2104438010 @default.
• W2104438010 citedByCount "0" @default.
• W2104438010 crossrefType "proceedings-article" @default.
• W2104438010 hasAuthorship W2104438010A5087208824 @default.
• W2104438010 hasConcept C105487726 @default.
• W2104438010 hasConcept C105795698 @default.
• W2104438010 hasConcept C111919701 @default.
• W2104438010 hasConcept C127413603 @default.
• W2104438010 hasConcept C136085584 @default.
• W2104438010 hasConcept C149635348 @default.
• W2104438010 hasConcept C154945302 @default.
• W2104438010 hasConcept C171250308 @default.
• W2104438010 hasConcept C192562407 @default.
• W2104438010 hasConcept C201995342 @default.
• W2104438010 hasConcept C2779227376 @default.
• W2104438010 hasConcept C2779751349 @default.
• W2104438010 hasConcept C2780598303 @default.
• W2104438010 hasConcept C2780615836 @default.
• W2104438010 hasConcept C33923547 @default.
• W2104438010 hasConcept C41008148 @default.
• W2104438010 hasConcept C49774154 @default.
• W2104438010 hasConcept C53524968 @default.
• W2104438010 hasConcept C9390403 @default.
• W2104438010 hasConcept C94263209 @default.
• W2104438010 hasConcept C98045186 @default.
• W2104438010 hasConceptScore W2104438010C105487726 @default.
• W2104438010 hasConceptScore W2104438010C105795698 @default.
• W2104438010 hasConceptScore W2104438010C111919701 @default.
• W2104438010 hasConceptScore W2104438010C127413603 @default.
• W2104438010 hasConceptScore W2104438010C136085584 @default.
• W2104438010 hasConceptScore W2104438010C149635348 @default.
• W2104438010 hasConceptScore W2104438010C154945302 @default.
• W2104438010 hasConceptScore W2104438010C171250308 @default.
• W2104438010 hasConceptScore W2104438010C192562407 @default.
• W2104438010 hasConceptScore W2104438010C201995342 @default.
• W2104438010 hasConceptScore W2104438010C2779227376 @default.
• W2104438010 hasConceptScore W2104438010C2779751349 @default.
• W2104438010 hasConceptScore W2104438010C2780598303 @default.
• W2104438010 hasConceptScore W2104438010C2780615836 @default.
• W2104438010 hasConceptScore W2104438010C33923547 @default.
• W2104438010 hasConceptScore W2104438010C41008148 @default.
• W2104438010 hasConceptScore W2104438010C49774154 @default.
• W2104438010 hasConceptScore W2104438010C53524968 @default.
• W2104438010 hasConceptScore W2104438010C9390403 @default.
• W2104438010 hasConceptScore W2104438010C94263209 @default.
• W2104438010 hasConceptScore W2104438010C98045186 @default.
• W2104438010 hasLocation W21044380101 @default.
• W2104438010 hasOpenAccess W2104438010 @default.
• W2104438010 hasPrimaryLocation W21044380101 @default.
• W2104438010 hasRelatedWork W1987299419 @default.
• W2104438010 hasRelatedWork W1989139368 @default.
• W2104438010 hasRelatedWork W2004496608 @default.
• W2104438010 hasRelatedWork W2044546059 @default.
• W2104438010 hasRelatedWork W2065128404 @default.
• W2104438010 hasRelatedWork W2075906016 @default.
• W2104438010 hasRelatedWork W2092695716 @default.
• W2104438010 hasRelatedWork W2094793671 @default.
• W2104438010 hasRelatedWork W2104438010 @default.
• W2104438010 hasRelatedWork W2023112358 @default.
• W2104438010 isParatext "false" @default.
• W2104438010 isRetracted "false" @default.
• W2104438010 magId "2104438010" @default.
• W2104438010 workType "article" @default.