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- W2104998486 abstract "Recent progress in the atomic-scale modeling of epitaxial growth and chemical-beam etching of GaAs(001) using kinetic Monte Carlo simulations of a simple solid-on-solid model is reviewed. The additional activation barrier to interlayer transport emerges as a key factor for the evolution of the surface morphology during both growth and etching." @default.
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- W2104998486 date "1995-01-01" @default.
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- W2104998486 title "Growth and Etching of GaAs(001)" @default.
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