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• W2105309592 abstract "We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250 °C under a hydrogen pressure of 1.3 × 10−2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm." @default.
• W2105309592 created "2016-06-24" @default.
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• W2105309592 date "2015-09-01" @default.
• W2105309592 modified "2023-10-18" @default.
• W2105309592 title "Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH" @default.
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• W2105309592 doi "https://doi.org/10.1063/1.4931080" @default.
• W2105309592 hasPublicationYear "2015" @default.
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