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- W2105870330 endingPage "292" @default.
- W2105870330 startingPage "288" @default.
- W2105870330 abstract "An electron cyclotron resonance (ECR) reactor was used to develop a low damage CF{sub 4}/O{sub 2}/Ar etch process for patterning submicron features in SiN{sub x} films on GaAs substrates. Statistically designed experiments were performed to optimize the process with regard to the following response variables (in order of importance): plasma damage tl the underlying GaAs substrate, sidewall profile (anisotropy), selectivity to photoresist, uniformity, and SiN{sub x} etch rate. Damage, as measured by the change in sheet carrier concentration of uniformly doped epilayers, increased with decreasing chamber pressure. Langmuir probe measurements indicated that the ion saturation current increased with decreasing chamber pressure. Further analysis of the data revealed that damage was strongly correlated with ion current density. Dependence of damage on ion energy was found to be a second-order effect. These findings indicate that in an ECR ion flux, not ion energy, plays the major role in introducing damage to the substrate. The addition of low level RF power was necessary to provide sidewall profile control. The data suggest that a high resolution, low damage plasma etch process can be uniquely achieved using an ECR reactor." @default.
- W2105870330 created "2016-06-24" @default.
- W2105870330 creator A5017017740 @default.
- W2105870330 creator A5049282266 @default.
- W2105870330 creator A5066198472 @default.
- W2105870330 creator A5073126007 @default.
- W2105870330 creator A5088116681 @default.
- W2105870330 date "1996-01-01" @default.
- W2105870330 modified "2023-09-27" @default.
- W2105870330 title "Optimization of a Low Damage, High Resolution Etch Process for SiN x in an ECR Reactor" @default.
- W2105870330 doi "https://doi.org/10.1149/1.1836424" @default.
- W2105870330 hasPublicationYear "1996" @default.
- W2105870330 type Work @default.
- W2105870330 sameAs 2105870330 @default.
- W2105870330 citedByCount "5" @default.
- W2105870330 countsByYear W21058703302012 @default.
- W2105870330 countsByYear W21058703302014 @default.
- W2105870330 crossrefType "journal-article" @default.
- W2105870330 hasAuthorship W2105870330A5017017740 @default.
- W2105870330 hasAuthorship W2105870330A5049282266 @default.
- W2105870330 hasAuthorship W2105870330A5066198472 @default.
- W2105870330 hasAuthorship W2105870330A5073126007 @default.
- W2105870330 hasAuthorship W2105870330A5088116681 @default.
- W2105870330 hasConcept C111919701 @default.
- W2105870330 hasConcept C113196181 @default.
- W2105870330 hasConcept C115952470 @default.
- W2105870330 hasConcept C116915560 @default.
- W2105870330 hasConcept C127413603 @default.
- W2105870330 hasConcept C138268822 @default.
- W2105870330 hasConcept C154945302 @default.
- W2105870330 hasConcept C185592680 @default.
- W2105870330 hasConcept C192562407 @default.
- W2105870330 hasConcept C41008148 @default.
- W2105870330 hasConcept C42360764 @default.
- W2105870330 hasConcept C43617362 @default.
- W2105870330 hasConcept C98045186 @default.
- W2105870330 hasConceptScore W2105870330C111919701 @default.
- W2105870330 hasConceptScore W2105870330C113196181 @default.
- W2105870330 hasConceptScore W2105870330C115952470 @default.
- W2105870330 hasConceptScore W2105870330C116915560 @default.
- W2105870330 hasConceptScore W2105870330C127413603 @default.
- W2105870330 hasConceptScore W2105870330C138268822 @default.
- W2105870330 hasConceptScore W2105870330C154945302 @default.
- W2105870330 hasConceptScore W2105870330C185592680 @default.
- W2105870330 hasConceptScore W2105870330C192562407 @default.
- W2105870330 hasConceptScore W2105870330C41008148 @default.
- W2105870330 hasConceptScore W2105870330C42360764 @default.
- W2105870330 hasConceptScore W2105870330C43617362 @default.
- W2105870330 hasConceptScore W2105870330C98045186 @default.
- W2105870330 hasIssue "1" @default.
- W2105870330 hasLocation W21058703301 @default.
- W2105870330 hasOpenAccess W2105870330 @default.
- W2105870330 hasPrimaryLocation W21058703301 @default.
- W2105870330 hasRelatedWork W1973707249 @default.
- W2105870330 hasRelatedWork W1980830479 @default.
- W2105870330 hasRelatedWork W2016568904 @default.
- W2105870330 hasRelatedWork W2017059834 @default.
- W2105870330 hasRelatedWork W2022748875 @default.
- W2105870330 hasRelatedWork W2026642978 @default.
- W2105870330 hasRelatedWork W2036075732 @default.
- W2105870330 hasRelatedWork W2047597498 @default.
- W2105870330 hasRelatedWork W2073457744 @default.
- W2105870330 hasRelatedWork W2564073664 @default.
- W2105870330 hasVolume "143" @default.
- W2105870330 isParatext "false" @default.
- W2105870330 isRetracted "false" @default.
- W2105870330 magId "2105870330" @default.
- W2105870330 workType "article" @default.