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- W2106077186 abstract "Results of a systematic study of damage generation and accumulation until amorphization induced by 180 keV Ca/sup +/ implantation in GaN films at liquid-nitrogen and room temperature are compared. The as implanted films show an expanded lattice. An initial amorphous component was found after implantation with a dose of 3/spl times/10/sup 14/ and 8/spl times/10/sup 14/ cm/sup -2/ at liquid-nitrogen and room temperature, respectively. The mechanism of amorphization is discussed and accumulation of amorphous clusters seems to be the reason for the collapse of the GaN crystalline state." @default.
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- W2106077186 date "2002-11-28" @default.
- W2106077186 modified "2023-09-27" @default.
- W2106077186 title "Structural characterization of Ca-ion implanted GaN" @default.
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- W2106077186 doi "https://doi.org/10.1109/iit.1998.813809" @default.
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