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- W2106326414 abstract "This paper describes a new VLSI diagnosis technique using the focused ion beam(FIB) technique combined with FIB assisted chemical vapor depostion of W films. It was found that this technique was very useful for failure analysis of VLSI by allowing for the capability of probing a specific internal circuit node on VLSI multi-level circuits. FIB induced damages on MOS transistors and methods to remove the dmages are also described." @default.
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- W2106326414 date "1987-04-01" @default.
- W2106326414 modified "2023-10-18" @default.
- W2106326414 title "A New VLSI Diagnosis Technique: Focused Ion Beam Assisted Multi-level Circuit Probing" @default.
- W2106326414 doi "https://doi.org/10.1109/irps.1987.362165" @default.
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