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• W2106548024 abstract "We have investigated the room temperature stability and the critical current uniformity of planar thin film YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// Josephson junctions. The junctions were fabricated using electron-beam lithography to define a stencil structure followed by ion damage from a conventional 200 keV ion implanter. Using this technique, we have fabricated junctions with weak link lengths of 20-100 nm that showed classical dc and ac Josephson effects at 77 K. By a suitable choice of damage and stencil width, these devices may be tuned to operate at any temperature between 1 K and the bulk transition temperature, and they may be placed anywhere on a wafer, providing a high degree of flexibility for circuit applications. Results obtained over several months showed a high level of room temperature stability, and the uniformity of the junctions was maintained." @default.
• W2106548024 created "2016-06-24" @default.
• W2106548024 creator A5039132185 @default.
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• W2106548024 date "1999-06-01" @default.
• W2106548024 modified "2023-10-01" @default.
• W2106548024 title "Stability and uniformity of planar high temperature Josephson junctions fabricated using nanolithography and ion damage" @default.
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• W2106548024 doi "https://doi.org/10.1109/77.783661" @default.
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