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- W2106835314 abstract "We have investigated and proposed a simple method to correlate optical absorption with high B doping concentrations in thin SiO2 films that offer a potential doping source for Si quantum dots. SiO2 films with boron and phosphorus were deposited using a computer controlled co-sputtering system. By assessing the absorption coefficients, it was observed that the doping can dramatically increase the absorption of the transparent SiO2. Additionally, the highly doped SiO2 films have a very broad Urbach like absorption tail and the absorption corresponds well with the doping level." @default.
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- W2106835314 date "2011-01-01" @default.
- W2106835314 modified "2023-09-23" @default.
- W2106835314 title "Optical evaluation of doping concentration in SiO2doping source layer for silicon quantum dot materials" @default.
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- W2106835314 doi "https://doi.org/10.1051/epjpv/2011024" @default.
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