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- W2106976688 abstract "In this paper, electron-beam (e-beam) lithography for processing of surface acoustic wave devices is investigated, and its suitability for large-scale processing discussed. Electron-beam lithography is used for exposure of surface acoustic wave (SAW) resonator patterns on polymethyl methacrylate (PMMA) coated piezoelectric substrates. Electron-beam lithography can be used for high frequency SAW designs, due to a minimal finger width of 100 nm to 400 nm. Such SAW devices can be used for high-frequency sensor applications. This contribution will consider processing, on-wafer characterization, and characterization of sensor effects in instrumentation applications." @default.
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- W2106976688 date "2009-03-01" @default.
- W2106976688 modified "2023-10-11" @default.
- W2106976688 title "Electron-beam processed SAW devices for sensor applications" @default.
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- W2106976688 doi "https://doi.org/10.1109/ssd.2009.4956715" @default.
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