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• W2107500265 startingPage "854" @default.
• W2107500265 abstract "Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO(2) layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously." @default.
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• W2107500265 date "2012-01-03" @default.
• W2107500265 modified "2023-09-28" @default.
• W2107500265 title "Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition" @default.
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• W2107500265 doi "https://doi.org/10.1364/oe.20.000854" @default.
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