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- W2109746279 abstract "We succeeded to fabricate SiC buried gate static induction transistors (BGSITs) with the current rating of 35 A at the power density of 200 W/cm2. The saturation current exceeded 130 A. The breakdown voltage V BR and the on-resistance R o n were 1200 V at the gate voltage V G of −2.5 V and 26 mΩ at V G of +2.5 V, respectively. The blocking gain of 480 was greatly improved compared with our previous work (∼100) due to the optimization of the fabrication process, especially related to the channel formation. Considering the active area A of 6.76 mm2, we calculated the specific on-resistance R onA as 1.8 mΩ- cm2, which is a lowest one among the SiC switching devices with V BR >1200 V that have been reported up to now except our previous report on small chip BGSIT (A=0.853 mm2). The leakage current was less than 10−7 A at the drain voltage of 1000 V at room temperature and increased by only one order of magnitude at 200°C. The R on increased from 26 mil at RT to 74 ma at 200°C." @default.
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- W2109746279 date "2010-06-06" @default.
- W2109746279 modified "2023-09-29" @default.
- W2109746279 title "1200 V, 35 A SiC-BGSIT with improved blocking gain of 480" @default.
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