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- W2109772023 abstract "<para xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink> High-frequency characterizations of ultra thin 32 nm PECVD Si<formula formulatype=inline><tex Notation=TeX>$_{3}$</tex></formula>N<formula formulatype=inline> <tex Notation=TeX>$_{4}$</tex></formula> dielectric in an advanced metal–insulator–metal (MIM) capacitors are presented, with focus on the impact of design on the performance of MIM capacitors. Frequency dependent capacitance has been extracted over a wide range of frequency bandwidth. An equivalent model circuit of capacitors including four parameters was developed to explain this behavior. The results have been compared with the values obtained from a 3-D electromagnetic modeling. A specific chart has been introduced to predict the electrical performance of new MIM capacitor designs. </para>" @default.
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- W2109772023 date "2008-09-01" @default.
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- W2109772023 title "Impact of Design on High-Frequency Performance of Advanced MIM Capacitors Using Si$_{3}$N$_{4}$ Dielectric Layers" @default.
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- W2109772023 doi "https://doi.org/10.1109/tcapt.2008.2001128" @default.
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