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• W2110278923 endingPage "115201" @default.
• W2110278923 startingPage "115201" @default.
• W2110278923 abstract "We have developed a simple and reliable method for the fabrication of sub-10 nm wide nanogaps. The self-formed nanogap is based on the stoichiometric solid-state reaction between metal and silicon atoms during the silicidation process. The nanogap width is determined by the metal layer thickness. Our proposed method can produce symmetric and asymmetric electrode nanogaps, as well as multiple nanogaps within one unique process step, for potential application to biological/chemical sensors and nanoelectronics, such as resistive switches, storage devices, and vacuum channel transistors. This method provides high throughput and it is suitable for large-scale production." @default.
• W2110278923 created "2016-06-24" @default.
• W2110278923 creator A5003524239 @default.
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• W2110278923 date "2014-02-24" @default.
• W2110278923 modified "2023-09-24" @default.
• W2110278923 title "Self-formation of sub-10 nm nanogaps based on silicidation" @default.
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• W2110278923 doi "https://doi.org/10.1088/0957-4484/25/11/115201" @default.
• W2110278923 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/24561553" @default.
• W2110278923 hasPublicationYear "2014" @default.
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