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• W2110782973 startingPage "F210" @default.
• W2110782973 abstract "The high-temperature stability of lanthanum silicate gate dielectric metal-insulator-semiconductor (MIS) devices with either Ta or electrodes has been studied. After a , rapid thermal annealing (RTA) treatment, devices with Ta gate metal undergo an equivalent oxide thickness (EOT) increase from 0.62 to or higher, while devices with as the gate electrode experience an EOT increase from 0.62 to only . An EOT less than is achieved after a RTA, with a corresponding gate leakage of . Medium-energy ion scattering and X-ray diffraction (XRD) analysis reveal that the Ta gate metal undergoes a phase change due to reaction with above , while for no change in the XRD spectrum is detected. Interface state defect densities and leakage currents are reduced after the high-temperature processing. Results reveal the importance of the entire gate stack design and processing in obtaining good device properties." @default.
• W2110782973 created "2016-06-24" @default.
• W2110782973 creator A5005287576 @default.
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• W2110782973 date "2006-01-01" @default.
• W2110782973 modified "2023-10-14" @default.
• W2110782973 title "High-Temperature Stability of Lanthanum Silicate Gate Dielectric MIS Devices with Ta and TaN Electrodes" @default.
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• W2110782973 doi "https://doi.org/10.1149/1.2218757" @default.
• W2110782973 hasPublicationYear "2006" @default.
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