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- W2111271164 abstract "The growing demand from industry for high-precision systems introduces new challenges for positioning mechanisms. High accuracy and repeatability downto the sub-micron scale are not uncommon. This is often combined with extreme environments, like high UV light sources, electron beams or vacuum. Thisarticle focuses on the flexure mechanism for a largestroke planar XY-positioning system. Applications for such a flexure mechanism can be found in for example lithography, micromachining or microscopy." @default.
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- W2111271164 date "2011-01-01" @default.
- W2111271164 modified "2023-09-24" @default.
- W2111271164 title "A large stroke planar 2-DOF flexure-based positioning stage for vacuum environments" @default.
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