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- W2112892895 abstract "Historically, design margin and defects have been viewed as different topics, one a part of design and the other a part of a test. Shrinking process geometries are making the two part of a continuum. This paper discusses the leakage and delay behavior associated with classic resistive defects and compares it with transistor variation due to lithography." @default.
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- W2112892895 date "2008-01-01" @default.
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- W2112892895 title "Defect or Variation? Characterizing Standard Cell Behavior at 90 nm and Below" @default.
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- W2112892895 doi "https://doi.org/10.1109/tsm.2007.913191" @default.
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