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- W2113113331 abstract "We developed standard cell libraries for three technologies (130, 180 and 350 nm) using an automatic layout generation tool that we have developed. The automatic layout generation tool is improved so as to cope with phase shift mask and mismatch between transistor pitch and wire pitch, which appear commonly in VDSM technologies. The developed libraries are as competitive as manually-designed libraries in layout density and speed. The libraries are currently public to educational organizations in Japan after we verified the functionalities of all cells and the speed of basic combinational cells on the fabricated chips." @default.
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- W2113113331 date "2004-05-06" @default.
- W2113113331 modified "2023-09-27" @default.
- W2113113331 title "Automatic generation of standard cell library in VDSM technologies" @default.
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- W2113113331 doi "https://doi.org/10.1109/isqed.2004.1283647" @default.
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