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• W2113454530 endingPage "5451" @default.
• W2113454530 startingPage "5451" @default.
• W2113454530 abstract "SiOxNy thin films deposited by rf magnetron sputtering to realize low-loss optical multilayers have been studied. We have analyzed the variations of the optical and physicochemical properties of oxynitride layers according to the deposition parameters: the gas partial pressures, the rf power, and the target composition. A linear variation of the layer refractive index as a function of the oxygen partial pressure was observed as well as a strict substitution of O atoms by N atoms. Thanks to IR spectrophotometric analyses, a model of the oxynitride amorphous structure was proposed and confirmed by Bruggeman and Gained approximation methods. Finally, the absorption level of the oxynitride layers was studied by photothermal deflection spectroscopy." @default.
• W2113454530 created "2016-06-24" @default.
• W2113454530 creator A5073516174 @default.
• W2113454530 creator A5084845744 @default.
• W2113454530 date "1997-08-01" @default.
• W2113454530 modified "2023-09-27" @default.
• W2113454530 title "Synthesis and physicochemical characterization of silicon oxynitride thin films prepared by rf magnetron sputtering" @default.
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• W2113454530 doi "https://doi.org/10.1364/ao.36.005451" @default.
• W2113454530 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/18259365" @default.
• W2113454530 hasPublicationYear "1997" @default.
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