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- W2113996969 abstract "An overview of the advanced (45 nm and beyond) ion implant and USJ metrology applications using the modulated optical reflectance (MOR) technology is provided." @default.
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- W2113996969 date "2008-05-01" @default.
- W2113996969 modified "2023-09-26" @default.
- W2113996969 title "Advanced Dopant Metrology for 45 nm and Beyond" @default.
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- W2113996969 doi "https://doi.org/10.1109/asmc.2008.4529081" @default.
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