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• W2114041657 abstract "Methods for the accurate positioning of nanometric beads on a substrate have been developed over a number of years, and range from serial atomic force microscopy (AFM) techniques for single-bead positioning to parallel techniques for the positioning of large populations of beads in monolayer or multilayer architectures, typically from a liquid suspension. For example, topographic cues have been used for bead-based protein array production, although in this case, there is a random distribution of beads within the topography. Bead patterning has also been achieved in capillaries using a micromolding in capillaries (MIMIC) technique. Line patterns with micrometer widths are possible with this technique, achieving good multilayer organization. For monolayer bead patterning at micrometer dimensions, electrostatic forces and similar electrostatic assemblies using nanoxerography, as well as patterning by selective chemical functionalization, by transfer of particles from a liquid–liquid interface, and by subtracting top–down processes, are possible. Recently, approaches to the micropatterning of nanodimensioned beads based on contact printing have appeared. Single-particle resolution has been achieved by directed assembly of the nanobeads on structured poly(dimethylsiloxane) (PDMS) templates. The beads are then transferred from the filled PDMS template to a substrate by microcontact printing. The beads’ surface composition during assembly must be tuned tomaximize the bead–surface interaction forces and to avoid strong adherence to the PDMS. Printing of dry nanobeads is, however, hard to realize. On the other hand, selective removal of beads from a surface using PDMSstructured molds has been achieved by lift-off and microcontact stripping. While the former needs a 3 h contact heat treatment to pattern close-packed silica nanobeads, the latter reports on a resolution limitation due to the crystal packing of the beads. Normally, in the reported contact-printing-based methods, the beads have to be loosely attached so that bead transfer or removal will not be inhibited. Here we present a contact-stripping method for micropatterning nanobead arrays, based on structured poly(methyl methacrylate) (PMMA) stamps and using a nanoimprinter apparatus, which allows careful control of the temperature and pressure during the contact stripping. Scheme 1 represents the patterning method. PMMA stamps, produced by nanoimprint lithography, are placed on the top of the nanobead-coated substrate with the structured parts of the stamp in contact with the beads inside the nanoimprinter chamber. Then pressure and temperature are applied for a few minutes. Afterwards, the stamps are carefully separated from the substrate. As a result, the particles in contact with the stamp are removed from the substrate, producing nanobead-patterned regions that reproduce the structure of the stamp. Microcontact" @default.
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• W2114041657 date "2009-02-23" @default.
• W2114041657 modified "2023-10-06" @default.
• W2114041657 title "Large-Area, Nanoimprint-Assisted Microcontact Stripping for the Fabrication of Microarrays of Fouling/Nonfouling Nanostructures" @default.
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• W2114041657 doi "https://doi.org/10.1002/smll.200801454" @default.
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