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- W2115280205 abstract "Optical lithography has been the engine that has empowered semiconductor industry to continually reduce the half-pitchfor over 50 years. In early mask aligners a simple movie lamp was enough to illuminate the photomask. Illumination startedto play a more decisive role when proximity mask aligners appeared in the mid-1970s. Off-axis illumination was introducedto reduce diffraction effects. For early projection lithography systems (wafer steppers), the only challenge was to collectthe light efficiently to ensure short exposure time. When projection optics reached highest level of perfection, furtherimprovement was achieved by optimizing illumination. Shaping the illumination light, also referred as pupil shaping,allows the optical path from reticle to wafer to be optimized and thus has a major impact on aberrations and diffractioneffects. Highly-efficient micro-optical components are perfectly suited for this task. Micro-optics for illumination evolvedfrom simple flat-top (fly’s-eye) to annular, dipole, quadrupole, multipole and freeform illumination. Today, programmablemicro-mirror arrays allow illumination to be changed on the fly. The impact of refractive, diffractive and reflective microopticsfor photolithography will be discussed." @default.
- W2115280205 created "2016-06-24" @default.
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- W2115280205 date "2014-03-31" @default.
- W2115280205 modified "2023-09-27" @default.
- W2115280205 title "Micro-optics: enabling technology for illumination shaping in optical lithography" @default.
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- W2115280205 doi "https://doi.org/10.1117/12.2046116" @default.
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