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• W2115718746 abstract "An analysis is presented of a new horn antenna, fabricated by a novel micromachining technique, that uses crystallographic etching of silicon and ultraviolet lithography of an ultra-thick photoresist (SU-8). The horn was found to have low cross-polarized field levels and a predicted Gaussian coupling efficiency of 92.5%. The horn shape is governed by the crystal planes of the silicon substrate and the thickness of the photoresist and has up to four independent design parameters that allow a wide range of antenna patterns. A design for the horn that yields symmetric beam patterns was investigated by computer analysis, microwave scale modeling, and measurements of a micromachined horn at 585 GHz. The major features of the 585-GHz beam patterns agree well with the computer-generated and scaled beam patterns. We have thus demonstrated a new micromachinable horn that has great potential for integration into array structures." @default.
• W2115718746 created "2016-06-24" @default.
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• W2115718746 date "2001-06-01" @default.
• W2115718746 modified "2023-09-27" @default.
• W2115718746 title "Analysis of an octagonal micromachined horn antenna for submillimeter-wave applications" @default.
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• W2115718746 doi "https://doi.org/10.1109/8.931159" @default.
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