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• W2115772502 abstract "The evolution of Si(100) surfaces has been studied during oblique high-fluence ion sputtering by means of atomic force microscopy. The observed surface morphology is dominated by nanoscale ripples and kinetic roughening at small and large lateral scales, respectively. The large-scale morphology exhibits anisotropic scaling at high fluences with different roughness exponents ${ensuremath{alpha}}_{n}=0.76ifmmodepmelsetextpmfi{}0.04$ and ${ensuremath{alpha}}_{p}=0.41ifmmodepmelsetextpmfi{}0.04$ in the directions normal and parallel to the incident ion beam, respectively. Comparison to the predictions of single field and two-field (``hydrodynamic'') models of ion erosion suggests the relevance of nonlinearities that are not considered in the simpler anisotropic Kuramoto-Sivashinsky equation." @default.
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• W2115772502 date "2009-03-26" @default.
• W2115772502 modified "2023-10-16" @default.
• W2115772502 title "Anisotropic scaling of ripple morphologies on high-fluence sputtered silicon" @default.
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• W2115772502 doi "https://doi.org/10.1103/physrevb.79.115437" @default.
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