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• W2115795789 abstract "Deep sub-wavelength lithography is one of the most fundamental challenges for future scaling beyond 32nm as the industry is currently stuck at the 193nm lithography. Many ingenious technologies/tricks are developed to push the limit of 193nm lithography, e.g., immersion lithography and computational lithography. But they may not be sufficient for 22nm patterning. Meanwhile, next-generation lithography, such as EUV (Extreme Ultra-Violet) lithography may not be available for mass production in the near future. As a practical solution, double patterning lithography (DPL) has become a leading candidate for 22nm (and likely 16nm) lithography process. DPL poses new challenges for overlay control, layout decomposition, and up-stream physical designs. In this paper, we will discuss some recent advancements and challenges in layout decompositions and DPL friendly layout optimizations." @default.
• W2115795789 created "2016-06-24" @default.
• W2115795789 creator A5005854182 @default.
• W2115795789 creator A5006919764 @default.
• W2115795789 creator A5011883763 @default.
• W2115795789 creator A5049657236 @default.
• W2115795789 creator A5080091586 @default.
• W2115795789 date "2009-10-01" @default.
• W2115795789 modified "2023-09-22" @default.
• W2115795789 title "Layout optimizations for double patterning lithography" @default.
• W2115795789 cites W1594489858 @default.
• W2115795789 cites W1972894956 @default.
• W2115795789 cites W1977347983 @default.
• W2115795789 cites W1980997491 @default.
• W2115795789 cites W1982352410 @default.
• W2115795789 cites W1990184359 @default.
• W2115795789 cites W1996690788 @default.
• W2115795789 cites W2003971204 @default.
• W2115795789 cites W2004276420 @default.
• W2115795789 cites W2007635793 @default.
• W2115795789 cites W2008015292 @default.
• W2115795789 cites W2009102457 @default.
• W2115795789 cites W2012552926 @default.
• W2115795789 cites W2014005374 @default.
• W2115795789 cites W2025141830 @default.
• W2115795789 cites W2047305564 @default.
• W2115795789 cites W2051703896 @default.
• W2115795789 cites W2055477348 @default.
• W2115795789 cites W2071574315 @default.
• W2115795789 cites W2074585790 @default.
• W2115795789 cites W2082074140 @default.
• W2115795789 cites W2082542863 @default.
• W2115795789 cites W2090972413 @default.
• W2115795789 cites W2095304297 @default.
• W2115795789 cites W2105474957 @default.
• W2115795789 cites W2108961335 @default.
• W2115795789 cites W2115092649 @default.
• W2115795789 cites W2128025415 @default.
• W2115795789 cites W2139208347 @default.
• W2115795789 cites W2145674973 @default.
• W2115795789 cites W2148115459 @default.
• W2115795789 cites W2148380380 @default.
• W2115795789 cites W2169749069 @default.
• W2115795789 cites W2175772671 @default.
• W2115795789 cites W3149318025 @default.
• W2115795789 cites W592018936 @default.
• W2115795789 cites W2015622761 @default.
• W2115795789 doi "https://doi.org/10.1109/asicon.2009.5351308" @default.
• W2115795789 hasPublicationYear "2009" @default.
• W2115795789 type Work @default.
• W2115795789 sameAs 2115795789 @default.
• W2115795789 citedByCount "9" @default.
• W2115795789 countsByYear W21157957892015 @default.
• W2115795789 countsByYear W21157957892016 @default.
• W2115795789 countsByYear W21157957892017 @default.
• W2115795789 countsByYear W21157957892019 @default.
• W2115795789 countsByYear W21157957892020 @default.
• W2115795789 countsByYear W21157957892021 @default.
• W2115795789 crossrefType "proceedings-article" @default.
• W2115795789 hasAuthorship W2115795789A5005854182 @default.
• W2115795789 hasAuthorship W2115795789A5006919764 @default.
• W2115795789 hasAuthorship W2115795789A5011883763 @default.
• W2115795789 hasAuthorship W2115795789A5049657236 @default.
• W2115795789 hasAuthorship W2115795789A5080091586 @default.
• W2115795789 hasConcept C105487726 @default.
• W2115795789 hasConcept C136085584 @default.
• W2115795789 hasConcept C137905882 @default.
• W2115795789 hasConcept C162996421 @default.
• W2115795789 hasConcept C163581340 @default.
• W2115795789 hasConcept C171250308 @default.
• W2115795789 hasConcept C177409738 @default.
• W2115795789 hasConcept C182873914 @default.
• W2115795789 hasConcept C192562407 @default.
• W2115795789 hasConcept C199360897 @default.
• W2115795789 hasConcept C200274948 @default.
• W2115795789 hasConcept C204223013 @default.
• W2115795789 hasConcept C2779227376 @default.
• W2115795789 hasConcept C41008148 @default.
• W2115795789 hasConcept C49040817 @default.
• W2115795789 hasConcept C53524968 @default.
• W2115795789 hasConcept C94263209 @default.
• W2115795789 hasConceptScore W2115795789C105487726 @default.
• W2115795789 hasConceptScore W2115795789C136085584 @default.
• W2115795789 hasConceptScore W2115795789C137905882 @default.
• W2115795789 hasConceptScore W2115795789C162996421 @default.
• W2115795789 hasConceptScore W2115795789C163581340 @default.
• W2115795789 hasConceptScore W2115795789C171250308 @default.
• W2115795789 hasConceptScore W2115795789C177409738 @default.
• W2115795789 hasConceptScore W2115795789C182873914 @default.
• W2115795789 hasConceptScore W2115795789C192562407 @default.
• W2115795789 hasConceptScore W2115795789C199360897 @default.
• W2115795789 hasConceptScore W2115795789C200274948 @default.
• W2115795789 hasConceptScore W2115795789C204223013 @default.
• W2115795789 hasConceptScore W2115795789C2779227376 @default.
• W2115795789 hasConceptScore W2115795789C41008148 @default.
• W2115795789 hasConceptScore W2115795789C49040817 @default.
• W2115795789 hasConceptScore W2115795789C53524968 @default.
• W2115795789 hasConceptScore W2115795789C94263209 @default.
• W2115795789 hasLocation W21157957891 @default.
• W2115795789 hasOpenAccess W2115795789 @default.

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