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- W2116712680 abstract "Abstract A study of the interactions of energetic argon ions with silicon surfaces using molecular dynamics simulations is reported. A dynamic balance between ion-induced damage and recrystallization of the surface is detected. By manipulating ion energy, argon ions are able to both create disordered regions near the surface, and recrystallize these disordered regions." @default.
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- W2116712680 date "2002-01-01" @default.
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- W2116712680 title "Ion-induced damage and annealing of silicon. Molecular dynamics simulations" @default.
- W2116712680 doi "https://doi.org/10.1351/pac200274030419" @default.
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