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- W2116715930 abstract "A 50 nm gate length narrow-width SOI device structure has been studied using an in-house 3D ensemble Monte Carlo particle-based device simulator. We find a threshold voltage increase with decreasing channel width due to lateral quantum-mechanical size-quantization effect. We also find that the presence of even a single impurity in the channel region of the device (unintentional doping) gives rise to significant threshold voltage fluctuations based upon its location. In summary, quantum effects and short-range Coulomb interactions must be properly accounted for when investigating nanoscale devices." @default.
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- W2116715930 date "2005-04-01" @default.
- W2116715930 modified "2023-09-28" @default.
- W2116715930 title "How quantum effects and unintentional doping affect the threshold voltage of narrow-width SOI devices" @default.
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- W2116715930 doi "https://doi.org/10.1109/nano.2004.1392344" @default.
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