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- W2117838471 abstract "Semi-insulating (SI) InP obtained by iron phosphide ambient annealing has very low concentration of deep level defects and better electrical property than SI-InP annealed in phosphorus ambient. The defect suppression phenomenon correlates with Fe diffusion and substitution in the annealing process. Analysis of the experimental result suggests that a high activation ratio of incorporated Fe in InP has an effect of defect suppression in Fe-doped and Fe-diffused SI-InP." @default.
- W2117838471 created "2016-06-24" @default.
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- W2117838471 date "2005-10-24" @default.
- W2117838471 modified "2023-09-25" @default.
- W2117838471 title "Improvement of the electrical property of semi-insulating InP by suppression of compensation defects" @default.
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- W2117838471 doi "https://doi.org/10.1109/iciprm.2005.1517445" @default.
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