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• W2118748269 abstract "High-frequency small-signal capacitances of semiconductor junction vs temperature, from the initial conditions of filled and emptied traps in the junction depletion region, are used to determine the trap concentration and the thermal activation energies of trapped electrons and holes. Illustrations are given for silicon N + P diodes doped with gold impurity or irradiated with 1-MeV electrons, showing the room-temperature annealing for the latter." @default.
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• W2118748269 date "1972-03-01" @default.
• W2118748269 modified "2023-10-16" @default.
• W2118748269 title "Thermally Stimulated Capacitance (TSCAP) in <i>p-n</i> Junctions" @default.
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• W2118748269 doi "https://doi.org/10.1063/1.1654104" @default.
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