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- W2120492068 abstract "The growth of silicon dioxide in pure N 2 O has been evaluated by using conventional furnace oxidation method. The results have pointed out that neither lightly-doped nor heavily-doped substrates exhibit any self-limited growth behavior. The growth kinetics can be described by the linear-parabolic model. Enhanced oxidation has also been observed on heavily arsenic doped substrates in the pure N 2 O ambient." @default.
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- W2120492068 date "1993-09-01" @default.
- W2120492068 modified "2023-09-24" @default.
- W2120492068 title "Thermal Oxidation of Lightly- and Heavily-Doped Silicon in Pure N 2 O" @default.
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