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- W2120773030 abstract "The finite barrier height at AlGaN/GaN heterointerface causes the nonvanishing probability of penetration of electrons into it. Therefor e a nonzero carriers' concentration appears also in spacer layer of AlGaN/GaN MODFET. The existence of that charge has not been yet quantitatively considered, but the its influence is observed on high gate polarisation in AlGaAs/GaAs heterostructure (1, 2, 3). Theoretical investigation of surface concentration in this layer nt for various gate voltages has shown the increasing character if gate voltage is increased. The comparison between surface concentration in spacer layer and in the channel suggests that the former one can't be considered negligible, especially for higher values of gate voltages, when it becomes comparable with the latter. The possible consequences of this effect on devices' operation undoubtly deserve to be examined (at least as the influence of parasitic capacitances if the considerably degraded mobility of these electrons compared to the mobility of channel carriers is beforehand accepted). II NTRODUCTION It is well known that two materials with different energy gaps (the smaller energy gap entirley lies within the bigger one) form heterojunction which is widely exploited in current device physics and microelectronics. At this heterojunction the conducting channel arises, mostly situated in the region of smaller energy gap semiconductor. That means that the electrons (being main carriers) are confined in the vicinity of heterointerface. Surface concentration of these carriers is examined in details, both theoretically and experimentally (4, 5). But the finite depth of potential well which confines carriers implies the nonzero probability of their penetration into another side of the heterointerface. This fact has usually been ignored and the influence of these carriers on device's operation inadequately examined. In this paper the simple model for determination of surface concentration of carriers in buffer layer has been developed and applied in the case of well known (N + )AlGaN/(p - )GaN HEMT. II BASIC OF THE MODEL The band structure of AlGaN/GaN is presented in Fig.1. When thermodynamical equilibrium arises the electrons become confined. The role of undoped layer in AlGaN is to separate ionized donors in it from electrons in 2DEG in order to prevent their mobility degradation." @default.
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- W2120773030 date "2002-01-01" @default.
- W2120773030 modified "2023-09-27" @default.
- W2120773030 title "Sheet Density of Electrons in Spacer Layer of AlGaN/GaN MODFET: Calculating and Analysing D.˝ evizovi¸ , R. Šašiand R. Ramovi¸" @default.
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