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- W2120835426 abstract "Several PECVD processes used in VLSI applications are discussed. Films have been deposited in a 200‐mm wafer single‐chamber PECVD reactor. The processes are characterized in terms of deposition rates, uniformity across 200‐mm silicon wafers, conformality over metal lines, density, etch rates, polish rates, stress, index of refraction, and stoichiometry. PECVD nitride processes with high deposition rates and good conformality are presented along with processes with etch rates comparable to LPCVD nitride films." @default.
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- W2120835426 date "1993-06-01" @default.
- W2120835426 modified "2023-09-26" @default.
- W2120835426 title "Characterization of Plasma‐Enhanced Chemical Vapor Deposited Nitride Films Used in Very Large Scale Integrated Applications" @default.
- W2120835426 doi "https://doi.org/10.1149/1.2221635" @default.
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