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- W2120850113 abstract "When silicon substrates are irradiated by 2.5 × 1016 31P+ ions/cm2 at 190 keV in the 〈111〉 direction, the ESR spectrum showed two resonances (g = 2.0057 and g = 2.0026). The former represents the amorphous state while the latter is a signal which cannot be seen at lower doses. They have different annealing characteristics between 100 and 800 °C. The composition of two independent Lorentzian spectra designed for these g-values can successfully reproduce the experimental spectrum observed after annealing at high temperatures. Wenn Siliziumsubstrate mit 2.5 × 1016 31P+-Ionen/cm2 bei 190 keV in 〈111〉-Richtung bestrahlt werden, zeigt das ESR-Spektrum zwei Resonanzlinien (g = 2,0057 und g = 2,0026). Die erstere rührt vom amorphen Zustand her, während die letztere ein Signal ist, das bei niedrigeren Dosen nicht beobachtbar ist. Sie zeigen unterschiedliche Temperungscharakteristiken zwischen 100 und 800 °C. Die Zusammensetzung von zwei unabhängigen Lorentzlinien mit diesen g-Werten kann das experimentelle Spektrum, das nach der Temperung bei hohen Temperaturen beobachtet wird, erfolgreich reproduzieren." @default.
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- W2120850113 date "1977-10-16" @default.
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- W2120850113 title "An ESR study of annealing characteristics for heavily irradiated silicon" @default.
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- W2120850113 doi "https://doi.org/10.1002/pssa.2210430207" @default.
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