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• W2121167145 abstract "Neutron reflectometry (NR) was used to directly measure the interface width between a titanium dioxide and a silicon dioxide film deposited by sol-gel processing. In a bilayer heated to 450°C, NR measurements showed that the interface width is 0.8 nm. This width is the same as the roughness of a sol-gel silicon dioxide surface after the same heat treatment, suggesting no interdiffusion or mixing at the bilayer interface." @default.
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• W2121167145 date "1993-10-01" @default.
• W2121167145 modified "2023-09-30" @default.
• W2121167145 title "Neutron Reflectometry Characterization of Interface Width between Sol-Gel Titanium Dioxide and Silicon Dioxide Thin Films" @default.
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• W2121167145 doi "https://doi.org/10.1111/j.1151-2916.1993.tb03978.x" @default.
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