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- W2121233367 abstract "Abstract Dedicated to the memory of Prof. Ulrich Gösele It has been shown by means of EPR and NMR technique that at the Si‐SiO 2 interface at appropriate oxidation temperature (time) local dynamical equilibrium may be achieved. At oxidation temperature 1130 °C the dencity of point defects is less than at lower and higher temperature (1100 °C and 1200 °C) and the content of absorbed impurities (hydrogen, oxygen) diminishes (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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- W2121233367 date "2010-12-22" @default.
- W2121233367 modified "2023-09-25" @default.
- W2121233367 title "Interaction of point defects with impurities in the Si-SiO2 system and its influence on the interface properties" @default.
- W2121233367 doi "https://doi.org/10.1002/pssc.201000269" @default.
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