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- W2123844558 abstract "The problem of electron injection from silicon into silicon dioxide is considered by means of a physical approach based on a simple model that provides good agreement with experimental data for MOS structures. The model implements the calculation of the electron energy distribution at the Si-SiO/sub 2/ interface by means of an efficient nonlocal algorithm, thus making possible a consistent treatment of the tunneling of hot electrons across the oxide. The oxide-field dependence of electron injection is addressed and the relationship between barrier lowering and electron energy distributions is discussed.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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- W2123844558 date "1993-01-01" @default.
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- W2123844558 title "Oxide-field dependence of electron injection from silicon into silicon dioxide" @default.
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- W2123844558 doi "https://doi.org/10.1109/16.239743" @default.
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