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- W2124446270 abstract "A nonthermal method of hardening positive photoresists by means of a scanned high-energy electron beam in preference to direct resist heating is described. It has been established that moderate electron doses produce significant resist cross-linking without flow. Plasma etch resistance can be enhanced in the resists with no degradation of the as-developed line profile." @default.
- W2124446270 created "2016-06-24" @default.
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- W2124446270 date "1982-01-01" @default.
- W2124446270 modified "2023-09-24" @default.
- W2124446270 title "Enhancement of resist plasma erosion rates by electron-beam hardening" @default.
- W2124446270 cites W2149185852 @default.
- W2124446270 doi "https://doi.org/10.1049/el:19820710" @default.
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