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- W2124502425 abstract "An adaptive mesh refinement technique is proposed for a two-dimensional finite-element multilayer process simulator. Mesh refinement is based on the dopant concentration ratio inside each element, together with a prediction technique, minimizing the interpolation errors. A significant reduction in CPU time is obtained by automatic grid refresh. Several methods were tested. The mesh adequacy is evaluated with bipolar test structures using analytical punch-through voltage calculations. Applications of these methods are presented in two ways. First, an advanced trench-isolated polysilicon bipolar transistor was simulated to show the general possibilities of the techniques, and second, a coupled process and device simulation approach allows the evaluation of the scheme on real structures in relation to experimental measurements.< <ETX xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>></ETX>" @default.
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- W2124502425 date "1992-03-01" @default.
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- W2124502425 title "Adaptive mesh refinement for multilayer process simulation using the finite element method" @default.
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- W2124502425 doi "https://doi.org/10.1109/43.124426" @default.
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