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- W2125156670 abstract "SCREAM process for releasing micromechanical MEMS structures using plasma polymerized fluorocarbon thin film for trench sidewall passivation is reported. The developed process is designed as a one mask process, and all etchings and depositions are fabricated in the same etching system (standard capacitive coupled RIE), as one-step-one-run process." @default.
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- W2125156670 date "2007-09-01" @default.
- W2125156670 modified "2023-09-26" @default.
- W2125156670 title "Thin FC film for sidewall passivation in SCREAM process for MEMS" @default.
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- W2125156670 doi "https://doi.org/10.1109/afrcon.2007.4401632" @default.
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