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- W2125523061 abstract "A thermal flow sensor with monolithically integrated channel structures for measurements of flow rates down to 40 nlmin <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>-1</sup> is presented. The sensor is based on a fabrication process using a high-temperature silicon nitride as protective coating. The channel is realised by means of surface micromachining and consists of SU-8. For chemical stability and to gain hydrophilic properties, the channel is coated on the inside by silicon-oxide and silicon-nitride as a moisture barrier. Sensor systems have been fabricated and characterised." @default.
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- W2125523061 date "2007-01-01" @default.
- W2125523061 modified "2023-09-23" @default.
- W2125523061 title "Thermoelectric Flow Sensors with Monolithically Integrated Channel Structures for Measurements of Very Small Flow Rates" @default.
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- W2125523061 doi "https://doi.org/10.1109/icsens.2007.4388529" @default.
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