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• W2126524735 abstract "In this investigation, the transmittance and electrical properties of NiFe thin films were measured under three conditions. NiFe thin films were sputtered on a glass substrate with a thickness (tf) from 300 Å to 1500 Å under the following conditions: (a) substrate temperature (Ts) maintained at room temperature (RT), (b) post-annealing at TA=150 °C for 1 h, and (c) post-annealing at TA=250 °C for 1 h. Transmission electron microscopy (TEM) demonstrated that the NiFe film yielded a strong face-centered cubic (FCC) (1 1 1) selected-area-diffraction (SAD) pattern. A spectral analyzer was utilized to measure transmittance through various thicknesses. Post-annealing treatment promoted the growth of grains, yielding a large average grain size, and therefore a small transmittance. However, electrical measurements revealed that increasing the electron mobility reduces the resistivity (ρ) and sheet resistance (Rs). At a thickness of 300 Å with post-annealing 250 °C, the optimal maximum transmittance is 50%; the optimal ρ is 110 μΩ cm, and the optimal Rs is 13 Ω/□. Accordingly, a 300 Å-thick NiFe thin film with favorable electrical and optical properties can be utilized in the components of a magneto-optical recording medium." @default.
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• W2126524735 date "2014-06-01" @default.
• W2126524735 modified "2023-10-15" @default.
• W2126524735 title "Effect of grain size on optical and electrical properties of Ni 80 Fe 20 thin films" @default.
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• W2126524735 doi "https://doi.org/10.1016/j.jmmm.2014.02.005" @default.
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