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• W2126861694 abstract "An improved theoretical analysis on the electrical characteristics of ferroelectric memory field-effect transistor (FeMFET) is given. First, we propose a new analytical expression for the polarization versus electric field (P-E) for the ferroelectric material. It is determined by one parameter and explicitly includes both the saturated and nonsaturated hysteresis loops. Using this expression, we then examine the operational properties for two practical devices such as the metal-ferroelectric-insulator-semiconductor field-effect transistor (MFIS-FET) and metal-ferroelectric-metal-insulator-semiconductor field-effect transistor (MFMIS-FET) as well. A double integral also has been used, in order to include the possible effects due to the nonuniform field and charge distribution along the channel of the device, to calculate the drain current of FeMFET. By using the relevant material parameters close to the (Bi, La)4Ti3O12 (BLT) system, accurate analyses on the capacitors and FeMFET's at various applied biases are made. We also address the issues of depolarization field and retention time about such a device." @default.
• W2126861694 created "2016-06-24" @default.
• W2126861694 creator A5081838658 @default.
• W2126861694 creator A5081874672 @default.
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• W2126861694 date "2003-01-01" @default.
• W2126861694 modified "2023-10-18" @default.
• W2126861694 title "Device modeling of ferroelectric memory field-effect transistor for the application of ferroelectric random access memory" @default.
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• W2126861694 doi "https://doi.org/10.1109/tuffc.2003.1176521" @default.
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