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- W2127015023 abstract "Abstract A two-dimensional ion implantation simulator based on LSS theory, named ILIAD ( I on implantation simulator with L SS theory I ntended for A dvanced D evice structures), has been developed. ILIAD applies the LSS theory to multilayered targets of various complex shapes by dividing them into appropriate small elements. Thus, it simulates impurity distributions in complex structures of actual devices such as a lightly doped drain MOSFET. In addition, the shadowing effect caused by tilted ion implantation has been successfully simulated, resulting in an asymmetrical distribution under a mask. It has been confirmed that this simulation is effective in optimizing ion implantation processes for complex device structures." @default.
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- W2127015023 date "1991-04-01" @default.
- W2127015023 modified "2023-09-27" @default.
- W2127015023 title "A versatile two-dimensional ion implantation simulator incorporated in an integrated process simulation system" @default.
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- W2127015023 doi "https://doi.org/10.1016/0167-9317(91)90163-8" @default.
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