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- W2127029357 abstract "As the feature sizes of integrated circuits have been continually reducing to below exposure wavelength, some correcting techniques, such as OPC and PSM are indispensable to compensate for the distortions on wafer images. In this paper, we describe an object-based approach to OPC named OPCM, which is a model-based OPC tool. Also, a rule-based OPC has been adopted to enhance the practicability of the software." @default.
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- W2127029357 date "2002-11-13" @default.
- W2127029357 modified "2023-09-23" @default.
- W2127029357 title "An object-based approach to optical proximity correction" @default.
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- W2127029357 doi "https://doi.org/10.1109/icasic.2001.982533" @default.
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