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- W2127113921 abstract "Graphite and silicon nanoneedles are fabricated by different etching processes on HOPG and SiOχ. The masks used to engrave such substrates are needle-shaped ferrite nanocrystals. We demonstrate that nanocrystals achieve the role of colloidal masks leading to resolutions down to 10 nm in distance between objects when the etched substrate is SiOχ and less than 3 nm when it is HOPG." @default.
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- W2127113921 date "2008-11-18" @default.
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- W2127113921 title "Motif Transfer: Down to 3 nm in Resolution Using Individual Nanocrystals" @default.
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- W2127113921 doi "https://doi.org/10.1002/adma.200703000" @default.
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